In a pure silicon, the number of electrons and holes per unit volume is $1.6 \times 10^{16} \,m^{-3}$. If silicon is doped with Boron in a way that the hole density increases to $4 \times 10^{22} \,m^{-3}$, then the electron density in the doped semiconductor will be:

$A$ crystal of intrinsic silicon at room temperature has a carrier concentration of $1.6 \times 10^{16} / m^3$. If the donor concentration level is $4.8 \times 10^{20} / m^3$, then the concentration of holes in the semiconductor is

$A$ positive hole in a semiconductor is

When the temperature of a semiconductor increases,then:

Consider an $n$-type semiconductor in which $n_e$ and $n_h$ are the number of electrons and holes,respectively.
$(A)$ Holes are minority carriers.
$(B)$ The dopant is a pentavalent atom.
$(C)$ $n_e n_h \neq n_i^2$ (where $n_i$ is the number of electrons or holes in the semiconductor when it is in its intrinsic form).
$(D)$ $n_e n_h \geq n_i^2$.
$(E)$ The holes are not generated due to the donors.
Choose the correct answer from the options given below.

In pure silicon,the electron-hole concentration at $T = 300 \ K$ is $7 \times 10^{15} \ m^{-3}$. Antimony is added as an impurity to silicon at a rate of $1$ atom per $10^7 \ Si$ atoms. Assume that half of the impurity atoms contribute their electrons to the conduction band. Calculate the factor by which the number of charge carriers increases. Given: the number density of silicon atoms is $5 \times 10^{28} \ m^{-3}$.