When germanium is doped with phosphorus,the doped material has

Doping of a semiconductor (with small impurity atoms) generally changes the resistivity as follows.

$A$ positive hole in a semiconductor is

In an intrinsic semiconductor,the energy gap $E_{g}$ is $1.2 \; eV$. Its hole mobility is much smaller than electron mobility and independent of temperature. What is the ratio between conductivity at $600 \; K$ and that at $300 \; K$? Assume that the temperature dependence of intrinsic carrier concentration $n_{i}$ is given by $n_{i} = n_{0} \exp \left(-\frac{E_{g}}{2 k_{B} T}\right)$,where $n_{0}$ is a constant.

$A$ silicon sample is made into a $p$-type semiconductor by doping. Indium atoms are added at a rate of one atom per $5 \times 10^7$ silicon atoms. If the number density of silicon is $5 \times 10^{28} \text{ atoms/m}^3$,calculate the number density of acceptor atoms per $\text{cm}^3$.

The impurity atoms which are mixed with pure silicon to make a $P$-type semiconductor are those of: