$A$ donor impurity results in

$A$ $P$-type semiconductor is:

The resistivity of a pure semiconductor is $0.5 \ \Omega m$. If the electron and hole mobility are $0.39 \ m^2 / V-s$ and $0.19 \ m^2 / V-s$ respectively,then calculate the intrinsic carrier concentration.

In a pure silicon, the number of electrons and holes per unit volume is $1.6 \times 10^{16} \,m^{-3}$. If silicon is doped with Boron in a way that the hole density increases to $4 \times 10^{22} \,m^{-3}$, then the electron density in the doped semiconductor will be:

To a germanium sample,traces of gallium are added as an impurity. The resultant sample would behave like

$A$ pure semiconductor has equal electron and hole concentration of $10^{16} \ m^{-3}$. Doping by gallium increases $n_{h}$ to $5 \times 10^{22} \ m^{-3}$. Then,the value of $n_{e}$ in the doped semiconductor is